发明申请
- 专利标题： Method for fabricating nano pore
- 专利标题（中）： 制造纳米孔的方法
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申请号： US10898319申请日： 2004-07-26
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公开(公告)号： US20050142298A1公开(公告)日： 2005-06-30
- 发明人: Jun Ho Kim , Kang Park , Ki Song , Eun Kim , Sung Lee
- 申请人： Jun Ho Kim , Kang Park , Ki Song , Eun Kim , Sung Lee
- 优先权： KR2003-97064 20031226
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; B05D3/00 ; B05D7/00 ; C25D11/02
摘要：
Provided is a method for fabricating a nanoscale pore which has been researched in a molecular electronics field of chemistry and in a molecular dynamics field of biology, wherein a oxidation pattern is selectively formed on a thin mask layer by anodic nano-oxidation using an AFM, and the oxidation pattern is selectively etched, thereby fabricating the nanoscale pore. Thus, the present invention provides a simple and easy method for fabricating nano pore array.
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