发明申请
- 专利标题： Method of manufacturing thin film magnetic head
- 专利标题（中）： 制造薄膜磁头的方法
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申请号： US11015422申请日： 2004-12-20
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公开(公告)号： US20050142668A1公开(公告)日： 2005-06-30
- 发明人: Woo Cheong , Yong Yoo , Doo Cho , Jae Lee , Ki Kim , Jeong Suh
- 申请人： Woo Cheong , Yong Yoo , Doo Cho , Jae Lee , Ki Kim , Jeong Suh
- 优先权： KR2003-94754 20031222; KR2004-11021 20040219
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
Provided is a method of manufacturing a thin film magnetic head. In particular, a method of manufacturing a thin film magnetic head is provided in which a flow process of a photoresist is applied to separate a hard magnetic layer and a metal multi-layer and a photoresist is used to insulate an upper electrode from a lower electrode in manufacturing a magnetic reproduction device, thereby simplifying and optimizing a manufacturing process and significantly reducing a manufacturing time
公开/授权文献
- US07384567B2 Method of manufacturing thin film magnetic head 公开/授权日：2008-06-10
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