发明申请
US20050146703A1 Device manufacturing method, device manufactured thereby and a mask for use in the method
有权
装置制造方法，由此制造的装置和用于该方法的掩模
- 专利标题： Device manufacturing method, device manufactured thereby and a mask for use in the method
- 专利标题（中）： 装置制造方法，由此制造的装置和用于该方法的掩模
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申请号： US11023359申请日： 2004-12-29
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公开(公告)号： US20050146703A1公开(公告)日： 2005-07-07
- 发明人: Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
- 申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V
- 当前专利权人： ASML NETHERLANDS B.V
- 当前专利权人地址： NL Veldhoven
- 优先权： EP01305341.8 20010620
- 主分类号： G03F1/16
- IPC分类号： G03F1/16 ; G03F7/20 ; H01L21/027 ; G03B27/54
摘要：
A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of raditaion as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
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