A pellicle which is excellent in transmittance and durability against short wavelength light, and which can be used for photolithography by using e.g. a KrF excimer laser, is provided. A pellicle for exposure to a light having a wavelength of at most 200 nm, which comprises a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane and/or the adhesive comprises a polymer containing repeating units represented by the following formula (1): wherein Q represents a C1-3 polyfluoroalkylene group having a linear structure, or a group having at least one atom selected from hydrogen atoms and fluorine atoms in such a polyfluoroalkylene group substituted by a substituent comprising a polyfluoroalkyl group which may contain an ethereal oxygen atom, or the like, and X represents a hydrogen atom, a fluorine atom or a C1-3 polyfluoroalkyl group which may contain an ethereal oxygen atom.