发明申请
- 专利标题: METHOD OF DETECTING OXYGEN LEAKAGE
- 专利标题(中): 检测氧气泄漏的方法
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申请号: US10710235申请日: 2004-06-28
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公开(公告)号: US20050148079A1公开(公告)日: 2005-07-07
- 发明人: Chun-Liang Tai , Yi-Chang Yang
- 申请人: Chun-Liang Tai , Yi-Chang Yang
- 优先权: TW092137018 20031226
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; G01N21/78 ; G01N31/00 ; G01N31/22 ; H01L21/66
摘要:
A method of detecting oxygen leakage. Firstly, a detection wafer having a substrate and a metallic film with a first color positioned on the substrate is provided. Then, the detection wafer is loaded into a reaction tube from a loading chamber, and subsequently, the detection wafer is unloaded from the reaction tube. Finally, a surface of the detection wafer is observed to obtain a second color of the metallic film, wherein if oxygen leaks into the loading chamber, the second color is different from the first color.
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