发明申请
- 专利标题: Pattern film forming method and pattern film forming apparatus
- 专利标题(中): 图案成膜方法和图案成膜装置
-
申请号: US11034805申请日: 2005-01-14
-
公开(公告)号: US20050150865A1公开(公告)日: 2005-07-14
- 发明人: Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
- 申请人: Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 优先权: JP2004-6800 20040114
- 主分类号: B41M5/00
- IPC分类号: B41M5/00 ; B44C1/17 ; C03C17/34 ; C03C17/42 ; H01L51/40 ; H01L51/50 ; H01L51/56 ; H05B33/10 ; C23F1/00 ; B44C1/22 ; C03C15/00 ; H01L21/469
摘要:
A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
公开/授权文献
信息查询