发明申请
- 专利标题: Immersion lithography fluids
- 专利标题(中): 浸没光刻液
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申请号: US10764227申请日: 2004-01-23
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公开(公告)号: US20050161644A1公开(公告)日: 2005-07-28
- 发明人: Peng Zhang , Bridgette Budhlall , Gene Parris , Leslie Barber
- 申请人: Peng Zhang , Bridgette Budhlall , Gene Parris , Leslie Barber
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; G03F7/004 ; G03F7/20 ; G03B11/00
摘要:
Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 248 nm are disclosed herein.
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