发明申请
- 专利标题: Silicon carbide single crystal and a method for its production
- 专利标题(中): 碳化硅单晶及其制造方法
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申请号: US10967070申请日: 2004-10-15
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公开(公告)号: US20050183657A1公开(公告)日: 2005-08-25
- 发明人: Kazuhiko Kusunoki , Shinji Munetoh , Kazuhito Kamei
- 申请人: Kazuhiko Kusunoki , Shinji Munetoh , Kazuhito Kamei
- 申请人地址: JP Osaka
- 专利权人: Sumitomo Metal Industries, Ltd.
- 当前专利权人: Sumitomo Metal Industries, Ltd.
- 当前专利权人地址: JP Osaka
- 优先权: JP2002-112382 20020415
- 主分类号: C30B11/00
- IPC分类号: C30B11/00 ; C30B29/36 ; C30B1/00
摘要:
A bulk silicon carbide single crystal of good crystalline quality which includes a minimized number of structural defects and is free from micropipe defects can be produced by crystal growth in a melt of an alloy comprising Si, C, and M (wherein M is either Mn or Ti) and having an atomic ratio between Si and M in which the value of x, when express as Si1-xMx, is 0.1≦×≦0.7 in the case where M is Mn or 0.1≦×≦0.25 in the case where M is Ti at a temperature of the melt which is below 2000° C. The C component is preferably supplied into the melt by dissolution of a graphite crucible which contains the melt such that the melt is free from undissolved C. One method of crystal growth is performed by cooling the melt after a seed substrate is immersed in the melt.
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