发明申请
US20050194096A1 Method and apparatus for semiconductor processing 审中-公开
用于半导体处理的方法和装置

Method and apparatus for semiconductor processing
摘要:
A method and apparatus for semiconductor processing is disclosed. In one embodiment, a method of transporting a wafer within a cluster tool, comprises placing the wafer into a first segment of a vacuum enclosure, the vacuum enclosure being attached to a processing chamber and a factory interface. The wafer is transported to a second segment of the vacuum enclosure using a vertical transport mechanism, wherein the second segment is above or below the first segment.
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