发明申请
- 专利标题: Semiconductor element and method for fabricating the same
- 专利标题(中): 半导体元件及其制造方法
-
申请号: US11062851申请日: 2005-02-23
-
公开(公告)号: US20050199911A1公开(公告)日: 2005-09-15
- 发明人: Keisuke Kojima , Toshiharu Tanbo , Keiichi Murayama
- 申请人: Keisuke Kojima , Toshiharu Tanbo , Keiichi Murayama
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 优先权: JP2004-066688 20040310
- 主分类号: H01L21/331
- IPC分类号: H01L21/331 ; H01L29/737 ; H01L29/739
摘要:
A heterojunction bipolar transistor comprises a collector layer, a base layer formed on the collector layer and an emitter layer formed on the base layer. The emitter layer includes a first semiconductor layer covering the entire top surface of the base layer and a second semiconductor layer formed on a predetermined part of the first semiconductor layer. An inactivated region is formed, by ion implantation, in a region of the collector layer located below the base layer except for a part thereof corresponding to the second semiconductor layer. The edge of the inactivated region is located away from the edge of the second semiconductor layer, and a region of the first semiconductor layer between the edge of the inactivated region and the edge of the second semiconductor layer is depleted.
公开/授权文献
- US07176098B2 Semiconductor element and method for fabricating the same 公开/授权日:2007-02-13
信息查询
IPC分类: