Invention Application
- Patent Title: Method and device for adjusting wavelength distribution pattern in laser
- Patent Title (中): 调整激光波长分布图的方法和装置
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Application No.: US11083738Application Date: 2005-03-18
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Publication No.: US20050205536A1Publication Date: 2005-09-22
- Inventor: Yoshihiro Norikane , Manabu Seo , Yasufumi Yamada
- Applicant: Yoshihiro Norikane , Manabu Seo , Yasufumi Yamada
- Priority: JP2004-0080733 20040319
- Main IPC: G02B26/08
- IPC: G02B26/08 ; B23K26/06 ; B23K26/067 ; G01J3/14 ; G01J3/18 ; G02B27/28 ; G02B27/46

Abstract:
A plurality of configurations is simultaneously formed in a material by a single laser beam having a desired distribution pattern of wavelengths. An input laser beam has an initial wavelength distribution pattern. The initial wavelength distribution pattern is adjusted or modified into a desired final wavelength distribution pattern. For example, the initial wavelength distribution pattern is a wide range of wavelengths in a single bell-curve distribution while the desired final wavelength distribution pattern has a specific number of sharp peaks each over a predetermined narrow range. The laser beam having the desired final wavelength distribution pattern is focused upon on a material. Because of the multiple peaks in the wavelength distribution, the laser beam is focused at a plurality of the focal distances. A number of structures is simultaneously formed in a material at the multiple focal points or at multiple locations/depths when the above laser beam is projected onto the material.
Public/Granted literature
- US07518086B2 Method and device for adjusting wavelength distribution pattern in laser Public/Granted day:2009-04-14
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