发明申请
- 专利标题： METHOD FOR FABRICATING METALLIC STRUCTURE
- 专利标题（中）： 制作金属结构的方法
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申请号： US10708702申请日： 2004-03-19
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公开(公告)号： US20050208435A1公开(公告)日： 2005-09-22
- 发明人: Irene Chen , Jyh-Huei Lay , Tien-Yu Chou , Yih-Far Chen , Yuan-Hung Wang , Jo-Wen Wu , Kuo-Hsiung Yen , Chin-Chen Yang , Chuan-Lun Hsu , Wei-Chih Ma , Hung-Lung Chuang
- 申请人： Irene Chen , Jyh-Huei Lay , Tien-Yu Chou , Yih-Far Chen , Yuan-Hung Wang , Jo-Wen Wu , Kuo-Hsiung Yen , Chin-Chen Yang , Chuan-Lun Hsu , Wei-Chih Ma , Hung-Lung Chuang
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/40
摘要：
First, a substrate is provided and a photoresist layer is coated thereon. Then, a film having a pattern is used as a mask to perform an exposing and developing process for patterning the photoresist layer. Following that, LIGA technology is employed to form a thin film having a pattern corresponding to the pattern of the film.
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