发明申请
- 专利标题： Method and system for target lifetime
- 专利标题（中）： 目标寿命的方法和系统
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申请号： US10810534申请日： 2004-03-26
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公开(公告)号： US20050211549A1公开(公告)日： 2005-09-29
- 发明人: Hui Chang , Chang Chao , Hong Wu
- 申请人： Hui Chang , Chang Chao , Hong Wu
- 主分类号： C23C14/32
- IPC分类号： C23C14/32 ; C23C14/34 ; H01L21/203 ; H01L21/66
摘要：
A method and system for determining a lifetime of a target for a physical vapor deposition tool (302), has, a mapping table (304a) of criteria for a minimum accumulating rate of Δ wafers fabricated by Δ target life for a target in the tool; and a database (304) recording Δ wafers fabricated by Δ target life for a target in the tool; and a computer (306) retrieving the criteria from the mapping table and entering the criteria in the database; and the tool (302) reporting Δ wafers fabricated by Δ target life for a target in the tool (302) for comparison with the criteria.
公开/授权文献
- US07282122B2 Method and system for target lifetime 公开/授权日：2007-10-16
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