发明申请
- 专利标题: Ion sources
- 专利标题(中): 离子源
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申请号: US10857449申请日: 2004-06-01
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公开(公告)号: US20050211923A1公开(公告)日: 2005-09-29
- 发明人: Peter Banks
- 申请人: Peter Banks
- 优先权: GB0406882.1 20040326
- 主分类号: H01J27/08
- IPC分类号: H01J27/08 ; H01J37/08 ; H01J37/32
摘要:
The invention relates to methods of controlling the effect of ions of an ionisable source gas that can react with interior surfaces of an arc chamber, by introducing ions of a displacement gas into the arc chamber, where the displacement gas ions are more chemically reactive with the material of the interior surfaces than the ions of the source gas. The source gas ions may typically be oxygen ions and the displacement gas ions are then typically fluorine ions where the interior surfaces comprise tungsten. The fluorine ions may, by way of example, be sourced from fluorine, silicon tetrafluoride or nitrogen trifluoride.
公开/授权文献
- US07301160B2 Ion sources 公开/授权日:2007-11-27