发明申请
- 专利标题: Aberration measuring method
- 专利标题(中): 畸变测量方法
-
申请号: US11100314申请日: 2005-04-05
-
公开(公告)号: US20050219515A1公开(公告)日: 2005-10-06
- 发明人: Hiroshi Morohoshi
- 申请人: Hiroshi Morohoshi
- 优先权: JP112170/2004(PAT.) 20040406
- 主分类号: G01M11/02
- IPC分类号: G01M11/02 ; G01B9/00 ; G03F7/20 ; H01L21/027
摘要:
Disclosed is a method of measuring aberration of a projection optical system, that includes an illuminating step for illuminating a reticle by use of light from a light source and through an illumination optical system, a projecting step for projecting an image of a test pattern formed on the reticle, upon a substrate through the projection optical system, a measuring step for measuring a positional deviation amount of the image of the test pattern, and a determining step for determining the aberration of the projection optical system on the basis of the positional deviation amount measured at the measuring step, wherein the projecting step includes a shaping step for shaping the light by use of shaping means disposed in one of the illumination optical system and the projection optical system and a light blocking pattern formed on a surface of the reticle, remote from a surface of the reticle where the test pattern is formed, so that the light passes only through a predetermined region of a pupil of the projection optical system.
公开/授权文献
- US07382446B2 Aberration measuring method 公开/授权日:2008-06-03