发明申请
- 专利标题: Vertical junction field effect transistor and method for fabricating the same
- 专利标题(中): 垂直结场效应晶体管及其制造方法
-
申请号: US10522278申请日: 2003-07-24
-
公开(公告)号: US20050230715A1公开(公告)日: 2005-10-20
- 发明人: Takashi Hoshino , Shin Harada , Kazuhiro Fujikawa , Satoshi Hatsukawa , Kenichi Hirotsu
- 申请人: Takashi Hoshino , Shin Harada , Kazuhiro Fujikawa , Satoshi Hatsukawa , Kenichi Hirotsu
- 申请人地址: JP Osaka 541-0041
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JP Osaka 541-0041
- 优先权: JP2002-215804 20020724; JP2002-235045 20020812
- 国际申请: PCT/JP03/09412 WO 20030724
- 主分类号: H01L29/80
- IPC分类号: H01L29/80 ; H01L21/337 ; H01L29/06 ; H01L29/808
摘要:
A vertical JFET 1a according to the present invention has an n+ type drain semiconductor portion 2, an n-type drift semiconductor portion 3, a p+ type gate semiconductor portion 4, an n-type channel semiconductor portion 5, an n+ type source semiconductor portion 7, and a p+ type gate semiconductor portion 8. The n-type drift semiconductor portion 3 is placed on a principal surface of the n+ type drain semiconductor portion 2 and has first to fourth regions 3a to 3d extending in a direction intersecting with the principal surface. The p+ type gate semiconductor portion 4 is placed on the first to third regions 3a to 3c of the n-type drift semiconductor portion 3. The n-type channel semiconductor portion 5 is placed along the p+ type gate semiconductor portion 4 and is electrically connected to the fourth region 3d of the n-type drift semiconductor portion 3.
公开/授权文献
信息查询
IPC分类: