发明申请
- 专利标题： Sputter target monitoring system
- 专利标题（中）： 溅射目标监测系统
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申请号： US10518293申请日： 2003-06-10
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公开(公告)号： US20050236266A1公开(公告)日： 2005-10-27
- 发明人: John Poole , Charles Wickersham
- 申请人： John Poole , Charles Wickersham
- 国际申请： PCT/US03/19740 WO 20030610
- 主分类号： C23C14/32
- IPC分类号： C23C14/32 ; C23C14/34 ; C23C14/54 ; H01J37/34
摘要：
A sputtering target monitoring system (20) for monitoring the status of a sputtering source target (22) during the sputtering process. The collection of data is initiated based on measured voltages in the sputtering source target (22), whereas the arcing count is determined based on current spikes or interruptions to the current in the sputtering source target (22) during the sputtering process. The real time data collected during the sputtering process is recorded and displayed in table or graphical format at any time during the sputtering process. Thus, problems in the sputtering process, or in the sputtering source (22), including an approaching end of life of the target may be easily ascertained. Alarms, messages or other indicators may be used to alert operators to problems or conditions during the sputtering process.
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