发明申请
- 专利标题： Device and method for determining an illumination intensity profile of an illuminator for a lithography system
- 专利标题（中）： 用于确定光刻系统的照明器的照明强度分布的装置和方法
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申请号： US10833651申请日： 2004-04-28
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公开(公告)号： US20050243299A1公开(公告)日： 2005-11-03
- 发明人: Christopher Spence , Todd Lukanc , Luigi Capodieci , Joerg Reiss , Sarah McGowan
- 申请人： Christopher Spence , Todd Lukanc , Luigi Capodieci , Joerg Reiss , Sarah McGowan
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/72
摘要：
A system and method for generating an illumination intensity profile of an illuminator that forms part of a projection lithography system. Radiation from the illuminator is projected towards an illumination profile mask having a plurality of apertures such that each aperture passes a distinct portion of the radiation. The intensity of each of the distinct portions of radiation is detected and assembled to form the illumination intensity profile.
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