发明申请
- 专利标题： Misalignment-tolerant methods for fabricating multiplexing/demultiplexing architectures
- 专利标题（中）： 制造复用/解复用架构的不对准方法
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申请号： US10837416申请日： 2004-04-30
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公开(公告)号： US20050245057A1公开(公告)日： 2005-11-03
- 发明人: Xiaofeng Yang , Sriram Ramamoorthi , Galen Kawamoto
- 申请人： Xiaofeng Yang , Sriram Ramamoorthi , Galen Kawamoto
- 主分类号： H01L27/02
- IPC分类号： H01L27/02 ; H01L27/118 ; H01L21/8234
摘要：
This disclosure relates to misalignment-tolerant processes for fabricating multiplexing/demultiplexing architectures. One process enables fabricating a multiplexing/demultiplexing architecture at a tolerance greater than a pitch of conductive structures with which the architecture is capable of communicating. Another process can enable creation of address elements and conductive structures having substantially identical widths.
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