发明申请
- 专利标题: Beam profile complex reflectance system and method for thin film and critical dimension measurements
- 专利标题(中): 光束轮廓复合反射系统和薄膜和临界尺寸测量方法
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申请号: US11109525申请日: 2005-04-18
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公开(公告)号: US20050248773A1公开(公告)日: 2005-11-10
- 发明人: Allan Rosencwaig
- 申请人: Allan Rosencwaig
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01B11/06 ; G01N21/21
摘要:
Device and method for measuring complex reflectance using a light source for generating a light beam with known polarization state, a lens for focusing the beam onto a sample surface such that various rays within the focused beam create a spread of angles of incidence θ, a waveplate for retarding one polarization state of the beam, a polarizer for generating interference between beam polarization states, and a detector with a two dimensional array of detector elements for generating intensity signals in response to the beam, wherein each detector element corresponds to a unique angle of incidence θ and azimuthal angle φ of the reflected beam. A processor calculates magnitude and phase values for the reflected beam by using the intensity signals corresponding to at least one incident angle θ and a plurality of azimuthal angles φ within the at least one incident angle θ sufficient to enable a meaningful Fourier analysis thereof.
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