- 专利标题: Reflective projection lens for EUV-photolithography
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申请号: US11183877申请日: 2005-07-19
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公开(公告)号: US20050248835A1公开(公告)日: 2005-11-10
- 发明人: Hans-Juergen Mann , Wilhelm Ulrich , Russell Hudyma
- 申请人: Hans-Juergen Mann , Wilhelm Ulrich , Russell Hudyma
- 专利权人: CARL ZEISS SMT AG
- 当前专利权人: CARL ZEISS SMT AG
- 主分类号: G02B17/00
- IPC分类号: G02B17/00 ; G02B17/06 ; G02B27/18 ; G03F7/20 ; H01L21/027 ; G02B5/08 ; F21V9/04 ; F21V9/06 ; G02B5/20 ; G02B7/182
摘要:
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.
公开/授权文献
- US07199922B2 Reflective projection lens for EUV-photolithography 公开/授权日:2007-04-03
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |