发明申请
- 专利标题: Electron beam apparatus and spacer
- 专利标题(中): 电子束装置和间隔器
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申请号: US11136485申请日: 2005-05-25
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公开(公告)号: US20050253068A1公开(公告)日: 2005-11-17
- 发明人: Nobuhiro Ito , Hideaki Mitsutake
- 申请人: Nobuhiro Ito , Hideaki Mitsutake
- 申请人地址: JP Ohta-ku
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Ohta-ku
- 优先权: JP10-285760 19981007; JP11-051650 19990226; JP11-283438 19991004
- 主分类号: H01J9/24
- IPC分类号: H01J9/24 ; H01J5/03 ; H01J29/02 ; H01J29/86 ; H01J29/87 ; H01J31/12 ; G21K7/00
摘要:
An electron beam apparatus including a hermetic container provided with an electron source, in which, when a first member is arranged in the hermetic container, at least part of the first member is coated with a film, and the film is configured in such a manner that it includes two regions, a first region and a second region different in electron density from the first region and the second region forms a network in the first region. This three-dimensional network structure allows a member being charged to be preferably controlled. Thereby, it is possible to control the effects of a member being charged which is used in an electron beam apparatus.
公开/授权文献
- US07281964B2 Method of producing spacer for an electron beam apparatus 公开/授权日:2007-10-16
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