发明申请
US20050253081A1 Method and equipment for detecting pattern defect 有权
检测图案缺陷的方法和设备

Method and equipment for detecting pattern defect
摘要:
An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
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