发明申请
- 专利标题: Method and equipment for detecting pattern defect
- 专利标题(中): 检测图案缺陷的方法和设备
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申请号: US11184981申请日: 2005-07-20
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公开(公告)号: US20050253081A1公开(公告)日: 2005-11-17
- 发明人: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- 申请人: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
- 优先权: JP10-372769 19981228; JP11-262997 19990917
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N21/88 ; G01N21/95 ; G01N21/956 ; G02B5/09 ; G02B26/12
摘要:
An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
公开/授权文献
- US07132669B2 Method and equipment for detecting pattern defect 公开/授权日:2006-11-07