发明申请
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US10484578申请日: 2002-07-22
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公开(公告)号: US20050258474A1公开(公告)日: 2005-11-24
- 发明人: Toshihiro Tanaka , Yukiko Umemoto , Mitsuru Hiraki , Yutaka Shinagawa , Masamichi Fujito , Kazufumi Suzukawa , Hiroyuki Tanikawa , Takashi Yamaki , Yoshiaki Kamigaki , Shinichi Minami , Kozo Katayama , Nozomu Matsuzaki
- 申请人: Toshihiro Tanaka , Yukiko Umemoto , Mitsuru Hiraki , Yutaka Shinagawa , Masamichi Fujito , Kazufumi Suzukawa , Hiroyuki Tanikawa , Takashi Yamaki , Yoshiaki Kamigaki , Shinichi Minami , Kozo Katayama , Nozomu Matsuzaki
- 优先权: JP2001-227203 20010727; JP2001-228870 20010730
- 国际申请: PCT/JP02/07371 WO 20020722
- 主分类号: G11C16/04
- IPC分类号: G11C16/04 ; H01L21/28 ; H01L21/336 ; H01L21/8247 ; H01L27/105 ; H01L29/423 ; H01L29/78 ; H01L29/788 ; H01L29/792
摘要:
A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section. Assuming that the thickness of a gate insulating film of the second transistor section is defined as tc and the thickness of a gate insulating film of the first transistor section is defined as tm, they have a relationship of tc