发明申请
- 专利标题: ION BEAM SYSTEM
- 专利标题(中): 离子束系统
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申请号: US10710051申请日: 2004-06-15
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公开(公告)号: US20050274910A1公开(公告)日: 2005-12-15
- 发明人: Tushar Desai , Ellis Hayford , Nicholas Mone
- 申请人: Tushar Desai , Ellis Hayford , Nicholas Mone
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01J37/02
- IPC分类号: H01J37/02 ; H01J37/317
摘要:
A method of reducing foreign material contamination of a substrate in an ion beam system and an ion beam system. The system, including: a vacuum chamber having an ion beam axis; a substrate chamber free to tilt about a tilt axis, the tilt axis orthogonal to and intersecting the ion beam axis; a flexible bellows connecting an opening in the substrate chamber and an opening in the vacuum chamber, both openings co-axially aligned with the ion beam axis, the bellows providing a vacuum seal between the substrate chamber and the vacuum chamber; and a hollow foreign material shield open at a top proximate to the vacuum chamber and a bottom proximate to the substrate chamber, the foreign material shield located between the ion beam axis and the flexible bellows, the top and bottom of the foreign material shield co-axially aligned with the ion beam axis.
公开/授权文献
- US07078710B2 Ion beam system 公开/授权日:2006-07-18