发明申请
- 专利标题: Film-forming composition, insulating material-forming composition, insulating film and electronic device
- 专利标题(中): 成膜组合物,绝缘材料形成组合物,绝缘膜和电子器件
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申请号: US11149385申请日: 2005-06-10
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公开(公告)号: US20050276964A1公开(公告)日: 2005-12-15
- 发明人: Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
- 申请人: Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 优先权: JPP.2004-172689 20040610; JPP.2004-278957 20040927; JPP.2004-279581 20040927; JPP.2004-279668 20040927; JPP.2005-053124 20050228; JPP.2005-164943 20050606
- 主分类号: C08G61/02
- IPC分类号: C08G61/02 ; C08J9/00 ; C08L65/00 ; B32B3/26
摘要:
A film-forming composition comprising: a compound having a specific cage structure; a pore-forming agent; an adhesion promoter; and so on, an insulating film formed from the film-forming composition and an electronic device comprising the insulating film.