- 专利标题: Method to reduce damage caused by irradiation of halogenated polymers
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申请号: US11190391申请日: 2005-07-26
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公开(公告)号: US20050279054A1公开(公告)日: 2005-12-22
- 发明人: Ganapati Mauze , Nikhil Trilokekar
- 申请人: Ganapati Mauze , Nikhil Trilokekar
- 专利权人: Aradigm Corporation
- 当前专利权人: Aradigm Corporation
- 主分类号: B32B27/08
- IPC分类号: B32B27/08 ; B65B55/08 ; B65B55/16 ; C08J3/28
摘要:
A method for producing a polymeric film resistant to degradation during sterilization such as gamma irradiation is presented. The method includes the steps of minimizing the number of free radicals formed during sterilization through use of an inert gas and a reactant scavenger within a sterilization pouch, which reactant scavenger may be acid adsorbents which scavenge the acid by-products formed during irradiation. The films retain physical and mechanical properties with long-term storage. The films are particularly amenable for use as packaging laminates in pharmaceutical, food, semiconductor and medical device industries.
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