发明申请
- 专利标题: Sample observing apparatus and sample observing method
- 专利标题(中): 样品观察装置和样品观察方法
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申请号: US11165572申请日: 2005-06-23
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公开(公告)号: US20060006330A1公开(公告)日: 2006-01-12
- 发明人: Masahiro Seyama , Masayuki Kuribara , Toshihiko Hara , Kazuhiro Arakawa , Toshimichi Iwai
- 申请人: Masahiro Seyama , Masayuki Kuribara , Toshihiko Hara , Kazuhiro Arakawa , Toshimichi Iwai
- 申请人地址: JP Tokyo
- 专利权人: Advantest Corporation
- 当前专利权人: Advantest Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JPJP2002-380192 20021227
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
There is provided a sample observing apparatus for observing the surface of a sample by irradiating an electron beam thereto, having an electron gun for irradiating the electron beam to the surface of the sample, a potential control section for adjusting electric potential of the surface of the sample to potential set in advance by applying voltage determined based on an amount of electric charge on the surface of the sample to the sample, an electron detecting section for detecting electrons produced when the electron beam is irradiated to the surface of the sample and an appearance acquiring section for acquiring the appearance of surface of the sample per each spot on the surface based on the electrons detected by the electron detecting section.
公开/授权文献
- US07262410B2 Sample observing apparatus and sample observing method 公开/授权日:2007-08-28
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