发明申请
- 专利标题： Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool
- 专利标题（中）： 对准方法和装置，光刻设备，装置制造方法和对准工具
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申请号： US10887311申请日： 2004-07-09
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公开(公告)号： US20060007441A1公开(公告)日： 2006-01-12
- 发明人: Joeri Lof
- 申请人： Joeri Lof
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G01B11/00
- IPC分类号： G01B11/00
摘要：
In one embodiment, front to back side alignment optics are used to project a mark on the back side of a substrate. The front to back side alignment optics are arranged such that the image projected into the image window of the front to back side alignment optics is a translational replica of the mark on the back side of the substrate. One potential advantage of such an arrangement is that any slight inaccuracies in the location of the optical axis do not result in inaccuracies in the image of the substrate mark. The translational replica image can be used for alignment of the substrate.
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