发明申请
- 专利标题: Coating apparatus and method using the same
- 专利标题(中): 涂布装置及其使用方法
-
申请号: US11178069申请日: 2005-07-07
-
公开(公告)号: US20060008591A1公开(公告)日: 2006-01-12
- 发明人: Lu Sun , Ching Wang , Wen Hsu , Yu-Ying Chan
- 申请人: Lu Sun , Ching Wang , Wen Hsu , Yu-Ying Chan
- 专利权人: INNOLUX DISPLAY CORP.
- 当前专利权人: INNOLUX DISPLAY CORP.
- 优先权: TW93120645 20040709
- 主分类号: B05D7/00
- IPC分类号: B05D7/00
摘要:
A coating apparatus (2) includes a work table (20) having a plurality of blowing holes (201) for suspending a substrate (200) thereabove, a coating unit (22) having a photoresist coating nozzle (222) and a supplying device (224) for photoresist material. The photoresist coating nozzle is disposed above the work table, and the supplying device connects to the coating nozzle for supplying photoresist thereto. In operation, the substrate to be coated is continuously suspended in the gas just above but not in contact with the work table. Therefore, accumulation of static electricity and/or foreign particles on the substrate can be avoided. Gas emitting from the blowing holes can remove foreign particles from the surface of the work table and the backside of the work table.
公开/授权文献
- US07326300B2 Coating apparatus and method using the same 公开/授权日:2008-02-05