- 专利标题: Wafer dividing method and apparatus
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申请号: US11183828申请日: 2005-07-19
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公开(公告)号: US20060016443A1公开(公告)日: 2006-01-26
- 发明人: Naoki Ohmiya , Yusuke Nagai , Masaru Nakamura
- 申请人: Naoki Ohmiya , Yusuke Nagai , Masaru Nakamura
- 专利权人: Disco Corporation
- 当前专利权人: Disco Corporation
- 优先权: JP2004-215111 20040723
- 主分类号: B28D1/02
- IPC分类号: B28D1/02
摘要:
A method of dividing a wafer whose strength is reduced along a plurality of dividing lines formed on the front surface in a lattice pattern, along the dividing lines, comprising: a tape affixing step for affixing a protective tape to one surface side of the wafer; a holding step for positioning a first suction-holding member and a second suction-holding member on both sides of a dividing line and suction-holding the wafer on the first suction-holding member and the second suction-holding member through the protective tape; and a dividing step for moving the first suction-holding member and the second suction-holding member in a direction for separating them from each other to exert tensile force in a direction perpendicular to the dividing line.
公开/授权文献
- US07063083B2 Wafer dividing method and apparatus 公开/授权日:2006-06-20
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