发明申请
US20060022150A1 Focused ion beam apparatus and focused ion beam irradiation method 有权
聚焦离子束装置和聚焦离子束照射法

Focused ion beam apparatus and focused ion beam irradiation method
摘要:
A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic field undergoes a change, the ion beam is focused without separating the isotopes on the sample at the same ion beam spot position as if the magnetic field is not existent. A canceling magnetic field is generated on the optical axis of the ion beam from a canceling magnetic field generator thereby to offset the deflection of the ion beam due to the external magnetic field.
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