发明申请
- 专利标题： Material with a hierarchical porosity comprising silicon
- 专利标题（中）： 具有分层孔隙率的材料包含硅
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申请号： US11165570申请日： 2005-06-24
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公开(公告)号： US20060030477A1公开(公告)日： 2006-02-09
- 发明人: Alexandra Chaumonnot , Aurelie Coupe , Clement Sanchez , Patrick Euzen , Cedric Boissiere , David Grosso
- 申请人： Alexandra Chaumonnot , Aurelie Coupe , Clement Sanchez , Patrick Euzen , Cedric Boissiere , David Grosso
- 优先权： FR04/06.940 20040624
- 主分类号： B01J29/04
- IPC分类号： B01J29/04 ; B01J29/06 ; B01J29/87
摘要：
A material with a hierarchical porosity is described, constituted by at least two spherical elementary particles, each of said spherical particles comprising zeolitic nanocrystals having a pore size in the range 0.2 to 2 nm and a matrix based on silicon oxide, which is mesostructured, having a pore size in the range 1.5 to 30 nm and having amorphous walls with a thickness in the range 1 to 20 nm, said spherical elementary particles having a maximum diameter of 10 μm. the matrix based on silicon oxide may contain aluminium. The preparation of said material is also described.
公开/授权文献
- US07994085B2 Material with a hierarchical porosity comprising silicon 公开/授权日：2011-08-09
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