发明申请
- 专利标题： Method to protect internal components of semiconductor processing equipment using layered superlattice materials
- 专利标题（中）： 使用分层超晶格材料保护半导体加工设备的内部部件的方法
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申请号： US10924321申请日： 2004-08-23
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公开(公告)号： US20060040508A1公开(公告)日： 2006-02-23
- 发明人: Bing Ji , Stephen Motika , Dingjun Wu , Eugene Karwacki , David Roberts
- 申请人： Bing Ji , Stephen Motika , Dingjun Wu , Eugene Karwacki , David Roberts
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; H01L21/469
摘要：
This invention relates to apparatus and a method to protect the internal components of semiconductor processing equipment such as a plasma reactor or a reactive species generator against physical and/or chemical damages during etching and/or cleaning processes. Layered superlattice materials having three or more metal elements such as strontium bismuth tantalate (SBT) are used to form a protective barrier on the surfaces of the internal components of a reaction chamber.