- 专利标题: Antistatic properties for thermally developable materials
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申请号: US10930438申请日: 2004-08-31
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公开(公告)号: US20060046215A1公开(公告)日: 2006-03-02
- 发明人: Thomas Ludemann , Gary LaBelle , Darlene Philip , Roland Koestner , Aparna Bhave
- 申请人: Thomas Ludemann , Gary LaBelle , Darlene Philip , Roland Koestner , Aparna Bhave
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 主分类号: G03C1/00
- IPC分类号: G03C1/00
摘要:
The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The thin backside overcoat layer serves to protect the buried antistatic layer.
公开/授权文献
- US07087364B2 Antistatic properties for thermally developable materials 公开/授权日:2006-08-08
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