发明申请
US20060050445A1 Magnetic film structure using spin charge, a method of manufacturing the same, a semiconductor device having the same, and a method of operating the semiconductor device
有权
使用自旋电荷的磁性膜结构,其制造方法,具有该自旋电荷的半导体器件,以及操作该半导体器件的方法
- 专利标题: Magnetic film structure using spin charge, a method of manufacturing the same, a semiconductor device having the same, and a method of operating the semiconductor device
- 专利标题(中): 使用自旋电荷的磁性膜结构,其制造方法,具有该自旋电荷的半导体器件,以及操作该半导体器件的方法
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申请号: US11193625申请日: 2005-08-01
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公开(公告)号: US20060050445A1公开(公告)日: 2006-03-09
- 发明人: Tae-wan Kim , Wan-jun Park , Sang-jin Park , In-jun Hwang , Soon-ju Kwon , Young-keun Kim , Richard Gambino
- 申请人: Tae-wan Kim , Wan-jun Park , Sang-jin Park , In-jun Hwang , Soon-ju Kwon , Young-keun Kim , Richard Gambino
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2004-0060719 20040731
- 主分类号: G11B5/33
- IPC分类号: G11B5/33 ; G11B5/127
摘要:
Provided are a multi-purpose magnetic film structure using a spin charge, a method of manufacturing the same, a semiconductor device having the same, and a method of operating the semiconductor memory device. The multi-purpose magnetic film structure includes a lower magnetic film, a tunneling film formed on the lower magnetic film, and an upper magnetic film formed on the tunneling film, wherein the lower and upper magnetic films are ferromagnetic films forming an electrochemical potential difference therebetween when the lower and upper magnetic films have opposite magnetization directions.
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