发明申请
- 专利标题: Method for fabricating field rings
- 专利标题(中): 制造现场环的方法
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申请号: US11207525申请日: 2005-08-19
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公开(公告)号: US20060051923A1公开(公告)日: 2006-03-09
- 发明人: Elmar Falck , Franz-Josef Niedernostheide , Hans-Joachim Schulze , Reiner Barthelmess
- 申请人: Elmar Falck , Franz-Josef Niedernostheide , Hans-Joachim Schulze , Reiner Barthelmess
- 优先权: DE102004040523.9-33 20040820
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
A method for fabricating a semiconductor and at least one second semiconductor zone of a semiconductor component having a semiconductor body having a first semiconductor zone. At least one field zone arranged in an edge region of the semiconductor body is reduced in size by means of an etching method. In another embodiment, the semiconductor body is partially removed in a region outside the first semiconductor zone. At least one second semiconductor zone is then fabricated in the partially removed region.
公开/授权文献
- US07268079B2 Method for fabricating a semiconductor having a field zone 公开/授权日:2007-09-11