发明申请
- 专利标题: Illumination optical system, exposure apparatus, and exposure method
- 专利标题(中): 照明光学系统,曝光装置和曝光方法
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申请号: US11140103申请日: 2005-05-31
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公开(公告)号: US20060055834A1公开(公告)日: 2006-03-16
- 发明人: Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
- 申请人: Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2002-351186 20021203; JP2003-201079 20030724; JP2003-338447 20030929
- 主分类号: G02F1/1335
- IPC分类号: G02F1/1335
摘要:
An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
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