发明申请
- 专利标题: Microstructures and method of manufacture
- 专利标题(中): 微结构和制造方法
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申请号: US11229772申请日: 2005-09-20
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公开(公告)号: US20060060472A1公开(公告)日: 2006-03-23
- 发明人: Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- 申请人: Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 优先权: JP2004-274556 20040922
- 主分类号: C25D11/20
- IPC分类号: C25D11/20
摘要:
In order to provide a structure which has a sufficiently large signal strength and generates local plasmon resonance of excellent reproducibility, the invention provides a process for manufacturing a structure at least a portion of which is an aluminum member having on a surface thereof an anodized layer having a plurality of micropores, the process comprising the steps of, in order, anodizing a surface of an aluminum member so as to form an anodized layer having micropores present therein, sealing the micropores in the anodized layer by filling the micropores with metal, surface-treating the sealed anodized layer so as to remove at least a portion of upper layer surface thereof and set the average surface roughness (Ra) to at most 30 nm, and subjecting the surface-treated anodized layer to electrodeposition so as to form metal particles on the metal filled into the micropores during sealing.
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