发明申请
- 专利标题: Semiconductor device and method for fabricating the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11193417申请日: 2005-08-01
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公开(公告)号: US20060060895A1公开(公告)日: 2006-03-23
- 发明人: Masahiro Hikita , Hiroaki Ueno , Yutaka Hirose , Manabu Yanagihara , Yasuhiro Uemoto , Tsuyoshi Tanaka
- 申请人: Masahiro Hikita , Hiroaki Ueno , Yutaka Hirose , Manabu Yanagihara , Yasuhiro Uemoto , Tsuyoshi Tanaka
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 优先权: JP2004-270925 20040917
- 主分类号: H01L31/112
- IPC分类号: H01L31/112 ; H01L29/20 ; H01L29/80
摘要:
In the structure of a semiconductor device of the present invention, a first source electrode is connected to a conductive substrate through a via hole, and a second source electrode is formed. Thus, even if a high reverse voltage is applied between a gate electrode and a drain electrode, electric field concentration likely to occur at an edge of the gate electrode closer to the drain electrode can be effectively dispersed or relaxed. Moreover, the conductive substrate is used as a substrate for forming element formation layers, so that a via hole penetrating the substrate to reach the backside thereof does not have to be formed in the conductive substrate. Thus, with the strength necessary for the conductive substrate maintained, the first source electrode can be electrically connected to a backside electrode.
公开/授权文献
- US07291872B2 Semiconductor device and method for fabricating the same 公开/授权日:2007-11-06
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