Invention Application
- Patent Title: High power, long focus electron source for beam processing
- Patent Title (中): 用于光束处理的大功率,长焦距电子源
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Application No.: US11143417Application Date: 2005-06-02
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Publication No.: US20060061285A1Publication Date: 2006-03-23
- Inventor: John Lewellen , John Noonan
- Applicant: John Lewellen , John Noonan
- Assignee: THE UNIVERSITY OF CHICAGO
- Current Assignee: THE UNIVERSITY OF CHICAGO
- Main IPC: H01J23/08
- IPC: H01J23/08

Abstract:
Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.
Public/Granted literature
- US07250727B2 High power, long focus electron source for beam processing Public/Granted day:2007-07-31
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