- 专利标题: Precursors for film formation
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申请号: US10947820申请日: 2004-09-22
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公开(公告)号: US20060063394A1公开(公告)日: 2006-03-23
- 发明人: Michael McSwiney , Huey-Chiang Liou , Michael Goodner , Robert Leet , Robert Meagley
- 申请人: Michael McSwiney , Huey-Chiang Liou , Michael Goodner , Robert Leet , Robert Meagley
- 主分类号: H01L21/31
- IPC分类号: H01L21/31
摘要:
A method including introducing a precursor in the presence of a circuit substrate, and forming a film including a reaction product of the precursor on the substrate, wherein the precursor includes a molecule comprising a primary species of the film and a modifier. A method including introducing a precursor in the presence of a circuit substrate, the precursor including a primary species and a film modifier as a single source, and forming a film on the circuit substrate. An apparatus including a semiconductor substrate, and a film on a surface of the semiconductor substrate, the film including a reaction product of a precursor including a molecule comprising a primary species and a modifier.
公开/授权文献
- US07071125B2 Precursors for film formation 公开/授权日:2006-07-04
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