发明申请
US20060066827A1 Alignment system, alignment method, and lithographic apparatus 有权
对准系统,对准方法和光刻设备

  • 专利标题: Alignment system, alignment method, and lithographic apparatus
  • 专利标题(中): 对准系统,对准方法和光刻设备
  • 申请号: US10950668
    申请日: 2004-09-28
  • 公开(公告)号: US20060066827A1
    公开(公告)日: 2006-03-30
  • 发明人: Dirk-Jan Bijvoet
  • 申请人: Dirk-Jan Bijvoet
  • 申请人地址: NL Veldhoven
  • 专利权人: ASML NETHERLANDS B.V.
  • 当前专利权人: ASML NETHERLANDS B.V.
  • 当前专利权人地址: NL Veldhoven
  • 主分类号: G03B27/42
  • IPC分类号: G03B27/42
Alignment system, alignment method, and lithographic apparatus
摘要:
A system and a method for aligning two devices with respect to each other are presented. A first of the devices is provided with a proximity switch and the second of the two devices may be provided with a reference mark. When the other device enters a detection area of the proximity switch, a first state of the proximity switch changes to a second state. Thus, the transition from the first state to the second state is a measure of a position of the second device with respect to the proximity switch. When the position of the second device is known with respect to the proximity switch, the devices may be positioned to a desired position with respect to each other. The proximity switch may be used to determine the position of the other device in a number of directions. Both the position and the orientation, i.e. rotation, of the first device with respect to the second device may be determined using the proximity switch.
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