发明申请
US20060068526A1 Acrylic polymer-containing gap filler forming composition for lithography
有权
用于光刻的含丙烯酸聚合物的间隙填料形成组合物
- 专利标题： Acrylic polymer-containing gap filler forming composition for lithography
- 专利标题（中）： 用于光刻的含丙烯酸聚合物的间隙填料形成组合物
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申请号： US10544129申请日： 2004-02-20
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公开(公告)号： US20060068526A1公开(公告)日： 2006-03-30
- 发明人: Satoshi Takei , Kazuhisa Ishii , Takahiro Kishioka , Yasushi Sakaida
- 申请人： Satoshi Takei , Kazuhisa Ishii , Takahiro Kishioka , Yasushi Sakaida
- 申请人地址： JP Chiyoda-ku 101-0054
- 专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址： JP Chiyoda-ku 101-0054
- 优先权： JP2003044045 20030221
- 国际申请： PCT/JP04/01981 WO 20040220
- 主分类号： H01L21/48
- IPC分类号： H01L21/48 ; C08K5/06
摘要：
There is provided a gap fill material forming composition for lithography that is used in dual damascene process and is excellent in flattening property and fill property. Concretely, it is a gap fill material forming composition characterized in that the composition is used in manufacture of semiconductor device by a method comprising coating a photoresist on a semiconductor substrate having a hole with aspect ratio shown in height/diameter of 1 or more, and transferring an image to the semiconductor substrate by use of lithography process, and that comprises a polymer, a crosslinking agent and a solvent.