- 专利标题: Fine metal hydride particles, their production process, dispersion containing fine metal hydride particles and metallic material
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申请号: US11296321申请日: 2005-12-08
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公开(公告)号: US20060070493A1公开(公告)日: 2006-04-06
- 发明人: Hideyuki Hirakoso , Keisuke Abe , Yasuhiro Sanada , Kentarou Tsunozaki
- 申请人: Hideyuki Hirakoso , Keisuke Abe , Yasuhiro Sanada , Kentarou Tsunozaki
- 申请人地址: JP Tokyo
- 专利权人: ASAHI GLASS COMPANY, LIMITED
- 当前专利权人: ASAHI GLASS COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2003-164666 20030610
- 主分类号: C01B6/00
- IPC分类号: C01B6/00 ; C22C1/05
摘要:
It is to provide fine particles of copper, nickel or palladium hydride having an average particle diameter of at most 50 nm, which are hardly oxidized in the atmosphere and are excellent in storage stability and are thereby very suitable for formation of metallic materials, and their production process. Further, it is to provide a dispersion containing fine particles of copper, nickel or palladium hydride, which is excellent in storage stability, and a metallic material obtained by applying the dispersion, followed by baking. The fine particles of copper, nickel or palladium hydride and the dispersion thereof, to be obtained by the present invention, are applicable to various applications, and they can be used for e.g. formation and repair of printed wiring, etc. employing a dispersion, interlayer wiring in semiconductor packages, and joining of printed wiring boards and electronic components.
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