A semiconductor memory device disclosed herein includes: a first select gate line, a gate electrode of a first select transistor connected to the first select gate line; a second select gate line, a gate electrode of a second select transistor connected to the second select gate line; and word lines between the first select gate line and the second select gate line, gate electrodes of memory cells being respectively connected to the word lines, wherein when data in a memory cell connected to a first adjacent word line which is adjacent to the first select gate line is read, a voltage of the second select gate line is increased after a voltage of the first select gate line is increased, and when data in a memory cell connected to a second adjacent word line adjacent to the second select gate line is read, the voltage of the first select gate line is increased after the voltage of the second gate line is increased.