发明申请
- 专利标题： Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light
- 专利标题（中）： 校正照明场中光强度的变化，而不会使光的远心变形
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申请号： US10962550申请日： 2004-10-13
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公开(公告)号： US20060077372A1公开(公告)日： 2006-04-13
- 发明人: Stephen Roux , Erik Loopstra , Michael Nelson
- 申请人： Stephen Roux , Erik Loopstra , Michael Nelson
- 申请人地址： NL Veldhoven
- 专利权人： ASML Holding N.V.
- 当前专利权人： ASML Holding N.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system comprising a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system of the photolithography system and a reticle stage of the photolithography system so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The blade structure is either translucent to a wavelength of the light or opaque to the wavelength. The first portion of the light has a first area. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that, when the illumination system provides the light having the illumination field, a second portion of the light within the illumination field impinges upon the blade structure. The second portion of the light has a second area. The second area is different from the first area.
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