发明申请
US20060078433A1 Sputter ion pump and manufacturing method therefor and image display device with sputter ion pump
审中-公开
溅射离子泵及其制造方法和溅射离子泵的图像显示装置
- 专利标题： Sputter ion pump and manufacturing method therefor and image display device with sputter ion pump
- 专利标题（中）： 溅射离子泵及其制造方法和溅射离子泵的图像显示装置
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申请号： US11281374申请日： 2005-11-18
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公开(公告)号： US20060078433A1公开(公告)日： 2006-04-13
- 发明人: Kazuyuki Seino , Yoshiyuki Shimada
- 申请人： Kazuyuki Seino , Yoshiyuki Shimada
- 优先权： JP2003-142240 20030520; JP2003-142241 20030520
- 主分类号： F04B37/02
- IPC分类号： F04B37/02 ; H02K44/00
摘要：
A sputter ion pump comprises a metal pump container. In the pump container are arranged a cathode and an anode opposed to each other in the pump container and a permanent magnet situated between the cathode and the inner surface of the pump container. After locating the anode, cathode, and magnetic material in the pump container, the magnetic material is magnetized from outside the pump container, thereby forming the permanent magnet.