利索-全球专利检索

  1. 登录
  2. 注册
发明申请
US20060087629A1 Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices 审中-公开
光学透镜元件，半导体平版印刷图案形成装置以及半导体器件的处理方法

Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
摘要：
An optical lens element is disclosed, formed of single crystal spinel material, the optical element having an optical transmittance of not less than 75%. Also, a lithographic patterning apparatus is disclosed, including a radiation source and a mask having a pattern arranged downstream of the radiation source, the mask receiving radiation to provide a patterned beam. Further, a projection optic for projecting the patterned beam onto a substrate is provided, the projection optic having multiple optical lens elements, at least one of which is comprised of single crystal spinel material, and a substrate table for receiving the substrate is provided. In addition, methods for processing semiconductor devices are disclosed.
摘要（中）：

公开了由单晶尖晶石材料形成的光学透镜元件，该光学元件具有不小于75％的光透射率。 此外，公开了一种平版印刷图案形成装置，其包括辐射源和具有布置在辐射源下游的图案的掩模，掩模接收辐射以提供图案化的光束。 此外，提供了用于将图案化的光束投影到基板上的投影光学元件，投影光学元件具有多个光学透镜元件，其中至少一个由单晶尖晶石材料构成，并且提供了用于接收基板的基板台。 此外，公开了半导体器件的处理方法。

信息查询
Global Dossier Espacenet
0/0