发明申请
- 专利标题： Substrate provided with a thin film pattern, method of manufacturing a device, electro-optic device, and electronic instrument
- 专利标题（中）： 具有薄膜图案的基板，制造装置的方法，电光装置和电子仪器
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申请号： US11256603申请日： 2005-10-21
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公开(公告)号： US20060091547A1公开(公告)日： 2006-05-04
- 发明人: Shinri Sakai , Toshimitsu Hirai
- 申请人： Shinri Sakai , Toshimitsu Hirai
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 优先权： JP2004-317558 20041101
- 主分类号： H01L23/48
- IPC分类号： H01L23/48 ; H01L21/44
摘要：
A thin film pattern substrate, including an area provided to the substrate to form a recess and including a wider section and a linear section connected to the wider section, wherein the wider section having a width greater than the width of the linear section, and a thin film pattern provided on the area, wherein a mean diameter of the wider section is set to be no greater than double the width of the linear section.
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